Ion implantation technique for the fabrication of very high-speed bipolar circuits is discussed in the paper, with emphasis on the ion implantation doping and shallow junction formation and the annealing of the implanted layer in bipolar device process.

  • 本文讨论了高速双极器件制造中的离子注入技术。重点讨论在双极器件制造工艺中的离子注入掺杂技术,离子注入形成浅结技术,以及离子注入层的退火技术。

  • 互联网摘选 2025-01-20 11:55:49

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